2 - Technologies

Micro-replication technique combines electron beam lithography and stamping technology for mass production of nanoscale structures. First, microstructures are etched into a silicon wafer or other material using electron beam lithography or other methods. This mold is pressed then into a second wafer, coated with polymer resist and heated. The silicon sandwich is then cooled and the mold withdrawn, leaving behind an imprint of the mold's structures. Ion etching of the replicant wafer removes the resist layer and cuts into the underlying substrate, but only in the embossed areas. Thus, a complementary pattern to the original mold is left on the wafer. And, because the mold was not altered in the process, it can be used for imprint more wafers.