Warsaw University of Technology
Institute of Microsystem Technology and Electronic Materials
http://www.ztmme.imio.pw.edu.pl/index.html/
Katarzyna Trzaskowska, ul.Koszykowa 75, Warsaw, 00-662, Poland
Prof. Ryszard Kisiel
kisiel(at)imio.pw.edu.pl
The Warsaw University of Technology, so named in 1915, continues the tradition of the Preparatory School for the Institute of Technology set up in Warsaw in 1826 thanks to the efforts of Stanisław Staszic. The University's roots also reach down to the Hipolit Wawelberg and Stanisław Rotwand School of Machine Construction and Electrical Engineering, created in 1895. The many generations of engineers it turned out and its significant contributions to the development of technical sciences earned the Warsaw University of Technology an acclaimed position in the country as well as international renown. The mission of the Warsaw University of Technology always remains the same: The knowledge and skills imparted to its students and the scientific studies it conducts must always serve Man and Mankind.
The Department of Microsystems Technology and Electronic Materials was created from the merger of the Department Optoelectronic Systems and Hybrid Instruments and the part of the Department of Microelectronics and Nanoelectronics. Although the facility is new, since he was appointed Rector of 5.VI.2006, however, its origins date back to 1963 when p.doc Stefan Okoniewski (later deputy director and director of the Institute of Electron Technology) arranged for the then Department of Communications Department of the Warsaw University of Technology Fundamentals of Technology.
The research subjects of the department involve: Carbide silicon as a substrate material for high-temperature electronics, high power and high frequency; Contacts and dielectric layers for devices based on gallium nitride; Plasma technology generation and characterization of dielectric layers for applications in thin-film and thick-film technologies; Characterization of electronic materials in the microwave frequency band; Microelectronics and optoelectronic detectors and instruments with layers of diamond and diamond; Electronic assembly technology, lead-free solders and polymers in electronics; Thick film hybrid circuits - design, construction and technology; Sensors, optoelectronic components and microsystems and fiber - modeling, design and technology.
http://www.ztmme.imio.pw.edu.pl/index.html/
Katarzyna Trzaskowska, ul.Koszykowa 75, Warsaw, 00-662, Poland
Prof. Ryszard Kisiel
kisiel(at)imio.pw.edu.pl
The Warsaw University of Technology, so named in 1915, continues the tradition of the Preparatory School for the Institute of Technology set up in Warsaw in 1826 thanks to the efforts of Stanisław Staszic. The University's roots also reach down to the Hipolit Wawelberg and Stanisław Rotwand School of Machine Construction and Electrical Engineering, created in 1895. The many generations of engineers it turned out and its significant contributions to the development of technical sciences earned the Warsaw University of Technology an acclaimed position in the country as well as international renown. The mission of the Warsaw University of Technology always remains the same: The knowledge and skills imparted to its students and the scientific studies it conducts must always serve Man and Mankind.
The Department of Microsystems Technology and Electronic Materials was created from the merger of the Department Optoelectronic Systems and Hybrid Instruments and the part of the Department of Microelectronics and Nanoelectronics. Although the facility is new, since he was appointed Rector of 5.VI.2006, however, its origins date back to 1963 when p.doc Stefan Okoniewski (later deputy director and director of the Institute of Electron Technology) arranged for the then Department of Communications Department of the Warsaw University of Technology Fundamentals of Technology.
The research subjects of the department involve: Carbide silicon as a substrate material for high-temperature electronics, high power and high frequency; Contacts and dielectric layers for devices based on gallium nitride; Plasma technology generation and characterization of dielectric layers for applications in thin-film and thick-film technologies; Characterization of electronic materials in the microwave frequency band; Microelectronics and optoelectronic detectors and instruments with layers of diamond and diamond; Electronic assembly technology, lead-free solders and polymers in electronics; Thick film hybrid circuits - design, construction and technology; Sensors, optoelectronic components and microsystems and fiber - modeling, design and technology.